EDN

VLSI confab melds explorations of semi process, design issues

MANHASSET, N.Y. — The interdependence between process and design is in full evidence at this year's VLSI Symposia, being held June 17-20 in Honolulu, Hawaii. The Symposium on VLSI Technology straddles ...
Nature

Hotspot Detection and Machine Learning in VLSI Design

Advances in very-large-scale integration (VLSI) design have increasingly relied on machine learning (ML) techniques to optimise performance, reduce manufacturing turnaround times and ensure high ...
EDN

VLSI: Intel’s 32-nm process ready for RF

SAN JOSE, Calif. — At this week's 2010 Symposium on VLSI Circuits in Hawaii, Intel Corp. has put a new twist on its previously-announced 32-nm process: It claims the technology is suitable for ...